Electron
sources
manufactured by STAIB Instruments are compact, light weight, high performance
instruments. The state-of-the-art
electron optical design is unique and provides many important benefits.
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Variable spot size,
high beam current at the sample, and large working distance.
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Highly stable
voltage and current supplies, within 10-4 or better, current, and beam position.
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Unique electron optical design that is factory pre-aligned and needs no
on-site adjustments. Final
focusing and beam positioning (X, Y) are easily accomplished, manually or
through a remote control box, over the entire operational current and voltage
range of the source.
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Low cathode
temperature ensures long life and compatibility with pressures
up to 10-4 torr (up to 10-2 torr with the efficient differential
pumping option). Cathode
assemblies are field replaceable without disturbing the electron source assembly.
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Unique remote control of beam focus, intensity, and position ensures ease
of use, allowing these adjustments at the chamber rather than at the instrument
rack.
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Outgassing
from the source is not detectable in typical UHV systems.
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Optional beam blanking and fast pulsing, to synchronize the beam or minimize
the load on the sample.
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Computer
control plug allows gun parameters to be computer controlled.
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Built-in diagnostic
capabilities.
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Technical support
of the equipment is provided by phone and fax, free of charge.
Electron
sources are available from STAIB Instruments across the range of 10 eV - 125
keV. Some models may be upgraded
for higher energy and additional options. Special
modifications are available to meet the needs of a given experiment.
Please contact our office for further information.
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