RHEED Systems
10 - 60 keV systems with remote control, Beam Blanking, Beam Rocking, Differential Pumping, computer control.
- For in situ surface analysis
- For material growth in UHV (MBE) 
- For high pressure and reactive gas applications, Torr RHEED™

 

RHEED imaging analyzer

- RHEED diagram energy filtering

- High energy in-situ ELS

RHEED accessories
- Phosphorus screens
- Shutters
- Pattern aligner

Acquisition, imaging, and control  software 
for Windows™ 2000 and XP:

- Fast video data acquisition and analysis
- Scanning electron microscopy software and control
- Scanning AUGER microscopy software and control
- Computer control for electron guns
- Spectrometer control and acquisition software

Energy spectrometers
Highest sensitivity and largest working distance for 
AES, SAM, XPS, UPS, ELS and ISS

Electron spin detector

Electron guns and sources
- Low energy sources from 1 - 500 eV
- Medium energy sources up to 10 keV
- High energy sources up to 125 keV
- Fine focus sources with to 200 nm spot size
- High resolution SEM down to 40 nm
- High power electron guns
- Flood guns
- General purpose sources and guns

Photo electron emission microscope PEEM
-
Modular microscope with high lateral resolution,
  Energy Filtering and UV Spectroscopy

 

Ion induced electron emission microscope IEEM 
- Won R&D 100 award in 2001
 

Ion sources

 

Vacuum systems
STAIB INSTRUMENTS has a long term experience 
in development and design of
- STAIB multi-technique systems
- Custom design systems
  


Some products are trade mark registered or patented, list available